Plasma processing

This article will address the topic of Plasma processing, which is of great relevance today. Plasma processing has captured the attention of many due to its impact on various aspects of society, culture and the world in general. Over the years, there has been growing interest and debate surrounding Plasma processing, leading to further study and research on this topic. This article will analyze different perspectives, data and opinions in order to provide a broad and complete overview of Plasma processing.

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Plasma processing is a plasma-based material processing technology that aims at modifying the chemical and physical properties of a surface.^[1]

Plasma processing techniques include:

• Plasma activation
• Plasma ashing
• Plasma cleaning
• Plasma electrolytic oxidation
• Plasma etching
• Plasma functionalization
• Plasma polymerization
• Corona treatment
• Plasma modification

Related topics are plasma chemistry, chemical vapor deposition, and physical vapor deposition processes like sputter deposition, plasma iondoping, vacuum plasmaspraying, and reactive ion etching.

References

1. ^ National Research Council (1991). Plasma Processing of Materials: Scientific Opportunities and Technological Challenges. Washington, DC: National Academies Press. doi:10.17226/1875. ISBN 978-0-309-04597-1.